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Characterization •Magnetotransport Apparatus •AC Susceptometer •Deep Level Transient Spectroscopy •Ellipsometer •Femtosecond Laser/ Streak Camera •Hall Measurement •Optical Spectroscopy •Probe Station •Raman Spectroscopy •Scanning Electron Microscope •X-ray Diffraction
Growth •Molecular Beam Epitaxy •Plasma Enhanced Chemical Vapor Epitaxy •Liquid Phase Epitaxy
Device Fabrication •Photolithography •Metallization
PhotolithographyKarl-Suss
The CMPL has set up a fabrication lab at Shono Laboratory which houses the Mask Aligner and Resist Spin coater.
Several Masks and Photoresists have been acquired and used to make two dimensional array of device components.